Group III nitride based quantum well light emitting device...

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257SE33027, C257SE33028

Reexamination Certificate

active

08044384

ABSTRACT:
Group III nitride based light emitting devices and methods of fabricating Group III nitride based light emitting devices are provided. The emitting devices include an n-type Group III nitride layer, a Group III nitride based active region on the n-type Group III nitride layer and comprising at least one quantum well structure, a Group III nitride layer including indium on the active region, a p-type Group III nitride layer including aluminum on the Group III nitride layer including indium, a first contact on the n-type Group III nitride layer and a second contact on the p-type Group III nitride layer. The Group III nitride layer including indium may also include aluminum.

REFERENCES:
patent: 5294833 (1994-03-01), Schetzina
patent: 5351255 (1994-09-01), Schetzina
patent: 5366927 (1994-11-01), Schetzina
patent: 5393993 (1995-02-01), Edmond et al.
patent: 5409859 (1995-04-01), Glass et al.
patent: 5523589 (1996-06-01), Edmond et al.
patent: 5585648 (1996-12-01), Tischler
patent: 5661074 (1997-08-01), Tischler
patent: 5670798 (1997-09-01), Schetzina
patent: 5679152 (1997-10-01), Tischler et al.
patent: 5679965 (1997-10-01), Schetzina
patent: 5684309 (1997-11-01), McIntosh et al.
patent: 5744829 (1998-04-01), Murasato et al.
patent: 5771256 (1998-06-01), Bhat
patent: 5777350 (1998-07-01), Nakamura et al.
patent: 5818072 (1998-10-01), Schetzina
patent: 5874747 (1999-02-01), Redwing et al.
patent: 6046464 (2000-04-01), Schetzina
patent: 6060335 (2000-05-01), Rennie et al.
patent: 6133589 (2000-10-01), Krames et al.
patent: 6150672 (2000-11-01), Kaneko
patent: 6153010 (2000-11-01), Kiyoku et al.
patent: 6153894 (2000-11-01), Udagawa
patent: 6156581 (2000-12-01), Vaudo et al.
patent: 6162656 (2000-12-01), Kunisato et al.
patent: 6172382 (2001-01-01), Nagahama et al.
patent: 6201262 (2001-03-01), Edmond et al.
patent: 6238945 (2001-05-01), Kaneko
patent: 6337493 (2002-01-01), Tanizawa et al.
patent: 6410939 (2002-06-01), Koide et al.
patent: 6447604 (2002-09-01), Flynn et al.
patent: 6452214 (2002-09-01), Kaneyama et al.
patent: 6459100 (2002-10-01), Doverspike et al.
patent: 6576933 (2003-06-01), Sugawara et al.
patent: 6586762 (2003-07-01), Kozaki
patent: 6608330 (2003-08-01), Yamada
patent: 6664560 (2003-12-01), Emerson et al.
patent: 6717185 (2004-04-01), Edmond et al.
patent: 6734033 (2004-05-01), Emerson et al.
patent: 6791119 (2004-09-01), Slater et al.
patent: 6794684 (2004-09-01), Slater et al.
patent: 6821800 (2004-11-01), Koide et al.
patent: 6833564 (2004-12-01), Shen et al.
patent: 6891268 (2005-05-01), Tomiya et al.
patent: 6943381 (2005-09-01), Gardner et al.
patent: 6958497 (2005-10-01), Emerson et al.
patent: 7279717 (2007-10-01), Yamada
patent: 7557380 (2009-07-01), Haberern et al.
patent: 2002/0053676 (2002-05-01), Kozaki
patent: 2002/0056836 (2002-05-01), Sawazaki et al.
patent: 2002/0195606 (2002-12-01), Edmond et al.
patent: 2003/0006418 (2003-01-01), Emerson et al.
patent: 2003/0020061 (2003-01-01), Emerson et al.
patent: 2003/0085409 (2003-05-01), Shen et al.
patent: 2003/0153112 (2003-08-01), Watanabe et al.
patent: 2004/0012011 (2004-01-01), Tomiya et al.
patent: 2005/0056824 (2005-03-01), Bergmann et al.
patent: 2006/0002442 (2006-01-01), Haberern et al.
patent: 2006/0046328 (2006-03-01), Raffetto et al.
patent: 2006/0186418 (2006-08-01), Edmond et al.
patent: 2007/0018198 (2007-01-01), Brandes et al.
patent: 2008/0258130 (2008-10-01), Bergmann et al.
patent: 2009/0283746 (2009-11-01), Chua et al.
patent: 0 881 666 (1998-12-01), None
patent: 1063711 (2000-12-01), None
patent: 1189289 (2002-03-01), None
patent: 1189289 (2002-03-01), None
patent: 1221723 (2002-07-01), None
patent: 1 313 187 (2003-05-01), None
patent: 6268257 (1994-09-01), None
patent: 07-162038 (1995-06-01), None
patent: 07-176826 (1995-07-01), None
patent: 08-023124 (1996-01-01), None
patent: 08-070139 (1996-03-01), None
patent: 08-162671 (1996-06-01), None
patent: 08-274414 (1996-10-01), None
patent: 08-330630 (1996-12-01), None
patent: 09-148678 (1997-06-01), None
patent: 09-153642 (1997-06-01), None
patent: 9162444 (1997-06-01), None
patent: 9219556 (1997-08-01), None
patent: 9266326 (1997-10-01), None
patent: 10012969 (1998-01-01), None
patent: 10-041581 (1998-02-01), None
patent: 10-065271 (1998-03-01), None
patent: 10065271 (1998-03-01), None
patent: 10145000 (1998-05-01), None
patent: 10145002 (1998-05-01), None
patent: 10-335757 (1998-12-01), None
patent: 10335757 (1998-12-01), None
patent: 11 040850 (1999-02-01), None
patent: 11040850 (1999-02-01), None
patent: 11040850 (1999-02-01), None
patent: 11074562 (1999-03-01), None
patent: 11-177175 (1999-07-01), None
patent: 11186659 (1999-07-01), None
patent: 11191638 (1999-07-01), None
patent: 11224972 (1999-08-01), None
patent: 11238945 (1999-08-01), None
patent: 11251684 (1999-09-01), None
patent: 11298090 (1999-10-01), None
patent: 11-330552 (1999-11-01), None
patent: 2000-068594 (2000-03-01), None
patent: 200150956 (2000-05-01), None
patent: 2000133883 (2000-05-01), None
patent: 2000-216432 (2000-08-01), None
patent: 200244072 (2000-09-01), None
patent: 2001-168471 (2001-06-01), None
patent: 2000307149 (2002-01-01), None
patent: WO 98/31055 (1998-07-01), None
patent: WO 99/05728 (1999-02-01), None
patent: WO 99/46822 (1999-09-01), None
patent: WO 00/21143 (2000-04-01), None
patent: WO 00/76004 (2000-12-01), None
patent: WO 02/05399 (2002-01-01), None
European Search Report corresponding to EP 03 07 8515; mailed on Feb. 2, 2004.
International Search Report for PCT/US 02/16407; Date of Mailing Nov. 13, 2002.
Notification of Transmittal of the International Search Report and the Written Opinion of the International Searching Authority, or the Declaration, corresponding to PCT/ US2005/022597, mailed Feb. 15, 2006.
Korean Non-Final Rejection and English Translation (8pages) corresponding to Korean Application No. 10-2008-7026427; Jan. 23, 2009.
Korean Non-Final Rejection and English Translation (12 pages) corresponding to Korean Application No. 10-2003-7012710, Facsimile Date: Sep. 21, 2008.
Partial European Search Report (6 pages) corresponding to European Application No. 09157557.1; Dated: May 28, 2009.
EPO Extended Search Report in corresponding EPO Application No. 10180319.5; Nov. 29, 2010, (6 pages).
American Heritage Dictionary, Second College Edition, 1982, Houghton Mifflin Company, Boston, MA., p. 867, definition of the English language word “On.”
Flynn, J.S., et al., Properties of Delta Doped A10.25Ga0.75N and GaN Epitaxial Layers, Abstract, Paper #L11.44, Materials Research Society 2002 Fall Symposium, Warrendale, PA, USA.
Kim, K.H., et al., “lll-nitride Ultraviolet Light-emitting Diodes with Delta Doping,”Appl. Phys. Lett., Jul. 21, 2003, pp. 566-568, vol. 83, No. 3.
Pan, Y.B., et al., “Reduction of Threading Edge Dislocation Density in n-type GaN by Si Delta-Doping,”Journal of Crystal Growth, Jan. 15, 2006, pp. 255-258, vol. 286, No. 2.
Sciana, B., et al., “Epitaxial Growth and Characterisation of Silicon Delta-Doped GaAs, AlAs and AlxGal-xAs,”Cryst. Res. Technol., Aug. 10, 2001, pp. 1145-1154, vol. 36.
Wang, L.S., et al., “Effects of Periodic Delta-doping on the Properties of GaN:Si Films Grown on Si (lll) Substrates,”Appl. Phys. Lett., Dec. 13, 2004, vol. 85, No. 24.
Zang, K., et al., “The Effect of Periodic Silane Burst on the Properties of GaN on Si (111) Substrates,”Singapore-MIT Alliance(SMA), Advanced Materials for Micro- and Nano-Systems (AMMNS), File No. AMMNS004.pdf, available in DSpace@MIT on Dec. 9, 2004, issued Jan. 2005.
KIPO's Preliminary Rejection in corresponding Korean Patent Application No. 10-2009-7022150 (3 pages w/2 page translation), Aug. 5, 2010.
Japanese Office Action and English Translation (5 pages) , corresponding Japanese Application No. 2007-523569; May 24, 2011.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Group III nitride based quantum well light emitting device... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Group III nitride based quantum well light emitting device..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Group III nitride based quantum well light emitting device... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4300169

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.