Group III nitride based flip-chip integrated circuit and...

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Having diverse electrical device

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S027000, C438S022000

Reexamination Certificate

active

10916819

ABSTRACT:
A flip-chip integrated circuit and method for fabricating the integrated circuit are disclosed. A method according to the invention comprises forming a plurality of active semiconductor devices on a wafer and separating the active semiconductor devices. Passive components and interconnections are formed on a surface of a circuit substrate and at least one conductive via is formed through the circuit substrate. At least one of the active semiconductor devices is flip-chip mounted on the circuit substrate with at least one of the bonding pads in electrical contact with one of the conductive vias. A flip-chip integrated circuit according to the present invention comprises a circuit substrate having passive components and interconnections on one surface and can have a conductive via through it. An active semiconductor device is flip-chip mounted on the circuit substrate, one of the at least one vias is in contact with one of the at least one the device's terminals. The present invention is particularly applicable to Group III nitride based active semiconductor devices grown on SiC substrates. The passive components and interconnects can then be formed on a lower cost, higher diameter wafer made of GaAs or Si. After separation, the Group III devices can be flip-chip mounted on the GaAs or Si substrate.

REFERENCES:
patent: 5192987 (1993-03-01), Khan et al.
patent: 5949140 (1999-09-01), Nishi et al.
patent: 6362525 (2002-03-01), Rahim
patent: 6586781 (2003-07-01), Wu et al.
patent: 6707161 (2004-03-01), Moon et al.
patent: 6965126 (2005-11-01), Taki
patent: 2001/0023964 (2001-09-01), Yifeng et al.
patent: 2002/0017727 (2002-02-01), Toshiya
patent: 2002/0068373 (2002-06-01), Lo et al.
patent: 0938139 (1999-08-01), None
patent: 2136203 (1984-09-01), None
Gaska et al. Hight Temperature Performance of AlGaN/GaN HFEts on SiC Substrates, IEE Electron Device Letters, vol. 18, No. 10, Oct. 1997, p. 492-494.
Wu et al., High Al Content AlGaN/GaN HEMTs With Very High Performance, IEDM-1999, Digest, Dec. 1999, pp. 925-927, Washington, D.C.
Lu et al., AlGaN/GaN HEMTs on SiC With Over 100GHs Ft and Low Microwave Noise, IEEE Transactions on Electron Devices, vol. 48, No. 3, Mar. 2001, p. 581-585.
Wu et al., Bias-Dependent Performance of High-Power AlGaN/GaN HEMTs, IEEE, 2001.
CRC Press “The Electrical Engineering Handbook”, 2ndEdition, DORF, p. 994, (1997).
Wu Y-F et al, “Very-High Power Density AlGaN/GaN HEMTS”, IEEE Transactions on Electron Devices, IEEE Inc. New York, US, vol. 48, No. 3, Mar. 2001, pp. 586-590, XP001039003. Section II “Device Technology”, p. 586, Section III “Device Performance”, p. 588, right column.
Wu Y-F et al, “14-W GaN-Based Microwave Power Amplifiers” Microwave Symposium Digest, 2000 IEEE MTT-S International Boston, MA, USA 11-16, Jun. 2000, pp. 963-965, XP010507496, ISBN: 0-7803-5687-X, Section II “Device Technology”, Section III “Circuit Design and Fabrication”, p. 963-964.
J.J. Wierer et al., “High-Power AlGaInN Flip-Chip Light Emitting Diodes”, Applied Physics Letters, vol. 78, No. 22, May 28, 2001, p. 3379-3381, XP002280202, p. 3380, left-hand column, fig. 1A, 1B.
Nguyen N X et al., “GaN/AlGaN MODFET With 80 GHs FMAXAND>100V Gate-Drain Breakdown Voltage” Electronics, IEE Stevenage, GB, vol. 33, No. 4, Feb. 13, 1997, pp. 334-335, XP006007044, ISSN:0013-5194, p. 332, left-hand Fig. 1.
Wu Y-F et al., “Gan-Based Fets for Microwave Power Amplification” IEICE Transactions on Electronics, Institute of Electronics Information and Comm. Eng. Tokyo, JP, vol. E82-C, No. 11, Nov. 1999, p. 1895-1905, XP000931553.
Xu J J et al, “A 3-10 GHs LCR-Matched Power Amplifier Using Flip-Chip Mounted AlGaN/GaN HEMTs” Microwave Symposium Digest, 2000 IEEE, MTT-S International Boston, MA, USA Jun. 11-16, 2000, Piscataway, NJ, USA, IEEE, US Jun. 11, 2000, p. 959-962, XP010507495.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Group III nitride based flip-chip integrated circuit and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Group III nitride based flip-chip integrated circuit and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Group III nitride based flip-chip integrated circuit and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3935993

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.