Gridless ion source for the vacuum processing of materials

Electric lamp and discharge devices – With positive or negative ion acceleration

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

3133631, 3133621, 31523131, H01J 152

Patent

active

059734477

ABSTRACT:
Plasma beam apparatus and method for the purpose of vacuum processing temperature sensitive materials at high discharge power and high processing rates. A gridless, closed or non-closed Hall-Current ion source is described which features a unique fluid-cooled anode with a shadowed gap through which ion source feed gases are introduced while depositing feed gases are injected into the plasma beam. The shadowed gap provides a well maintained, electrically active area at the anode surface which stays relatively free of non-conductive deposits. The anode discharge region is insulatively sealed to prevent discharges from migrating into the interior of the ion source. Thin vacuum gaps are also used between anode and non-anode components in order to preserve electrical isolation of the anode when depositing conductive coatings. The magnetic field of the Hall-Current ion source is produced by an electromagnet driven either by the discharge current or a periodically alternating current.

REFERENCES:
patent: 3735591 (1973-05-01), Burkhart
patent: 4541890 (1985-09-01), Cuomo et al.
patent: 4862032 (1989-08-01), Kaufman et al.
patent: 5475354 (1995-12-01), Valentian et al.
patent: 5508368 (1996-04-01), Knapp et al.
patent: 5646476 (1997-07-01), Aston
H.R. Kaufman, Technology of Closed-Drift Thrusters, AIAA Journal vol. 3, pp. 78-87 (1983).
Chuzhko, et al., Diamond and Related Materials, vol. 1, pp. 332-333 (1992). Diamond-like films deposition by magnetron sputtering with additional ionization.
Fedoseev, et al., Diamond and Related Materials, vol. 4, pp. 314-317 (1995). Deposition of .varies.-C:H films in a Hall accelerator plasma.
Okada, et al., Japanese Journal Applied Physics, vol. 31, pp. 1845-1854 (1992). Application of a Hall Accelerator to Diamondlike Carbon Film Coatings.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Gridless ion source for the vacuum processing of materials does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gridless ion source for the vacuum processing of materials, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gridless ion source for the vacuum processing of materials will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-768326

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.