Grid formed with silicon substrate

Details Grid formed with silicon substrate Grid formed with silicon substrate

1997-10-24

2000-01-25

Church, Craig E.

X-ray or gamma ray systems or devices

Beam control

Antiscatter grid

378145, G21K 100

Patent

active

06018566&

ABSTRACT:
An X-ray collimator grid is formed within a wafer of monocrystalline silicon material by forming a plurality of spaced parallel elongate slots within a planar surface of a silicon crystal wafer, and forming slats of heavy metal in situs within each of said slots, including squeegeeing the heavy metal into the slots, from particles of heavy metal, each said slat gripping the walls of an associated slot.

REFERENCES:
patent: 2605427 (1952-07-01), Delhumeau
patent: 4158141 (1979-06-01), Selliger
patent: 5416821 (1995-05-01), Frazier et al.
patent: 5418833 (1995-05-01), Logan

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