Grid-based resist simulation

Details Grid-based resist simulation Grid-based resist simulation

2008-05-27

2008-05-27

Young, Christopher G. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S005000, C716S030000, C716S030000, C716S030000

Reexamination Certificate

active

07378202

ABSTRACT:
A grid-based resist simulator predicts how a wafer coated with one or more resist layers will develop when exposed with a mask pattern. Image intensity values are calculated at a grid of points on the wafer, and the image intensity points are analyzed with a resist simulator that produces a resist surface function. A threshold contour of the resist surface function defines how the mask pattern will print on a wafer.

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Tollukuhn et al., “Do We Need Complex Resist Models For Predictive Simulation of Lithographic Process Performance?,” Database Accession No. 8128785, XP002443622, 2004.

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