Grey-splice algorithm for electron beam lithography post-process

Details Grey-splice algorithm for electron beam lithography post-process Grey-splice algorithm for electron beam lithography post-process

1992-03-24

1993-02-23

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01V 37302

Patent

active

051893061

ABSTRACT:
A method of developing grey-splices for use in an electron beam exposure apparatus subdivides rectangles of which a desired pattern is formed and which lie in sub-field overlap zones into sections and examines each section of the sub-field overlap zone to determine the best candidate for greying in order to avoid blooming due to overexposure and to minimize the possibility of exposure discontinuity. A data structure called a greytable list is accumulated to represent the portions of rectangles which lie in each section. Processing of each rectangle is minimized and groups of rectangles are processed in chains to increase the throughput of the system. The e-beam exposure apparatus is operated at optimal efficiency by minimizing the number of exposure spots which are greyed.

REFERENCES:
patent: 4507738 (1985-03-01), Nozawa et al.
patent: 4816692 (1989-03-01), Rudert, Jr.
patent: 4827423 (1989-05-01), Beasley et al.
patent: 4835700 (1989-05-01), Tanaka et al.

Affiliated with

Also associated with

Rating

Grey-splice algorithm for electron beam lithography post-process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Grey-splice algorithm for electron beam lithography post-process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Grey-splice algorithm for electron beam lithography post-process will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2207749