Graytone mask producing method, graytone mask and pattern...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S030000, C430S322000, C427S240000, C118S401000

Reexamination Certificate

active

06838215

ABSTRACT:
A method for producing a graytone mask capable of satisfying a dimensional accuracy of a predetermined graytone pattern, on a graytone mask having, at least in a part, a predetermined graytone pattern. Suppressed to ±1% or less an on-plane distribution in thickness of a resist film to be applied onto a substrate in a graytone mask producing process.

REFERENCES:
patent: 4902899 (1990-02-01), Lin et al.
patent: 5219615 (1993-06-01), Nakazawa et al.
patent: 5650196 (1997-07-01), Muhlfriedel et al.
patent: 5654041 (1997-08-01), Appich et al.
patent: 5665496 (1997-09-01), Omika et al.
patent: 5900273 (1999-05-01), Rasmussen et al.
patent: 6440634 (2002-08-01), Ohsawa et al.
patent: 20020004100 (2002-01-01), Gurer et al.
patent: 8-328235 (1996-12-01), None
patent: 2000-075466 (2000-03-01), None
patent: 2000-295232 (2001-08-01), None
FPD Intelligence, May, 1999.
Korean Office Action for Patent Application No. 2002-58830, dated Jun. 30, 2004.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Graytone mask producing method, graytone mask and pattern... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Graytone mask producing method, graytone mask and pattern..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Graytone mask producing method, graytone mask and pattern... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3407867

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.