Gray scale mask and depth pattern transfer technique using inorg

Details Gray scale mask and depth pattern transfer technique using inorg Gray scale mask and depth pattern transfer technique using inorg

1997-05-16

1999-12-07

Speer, Timothy

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430296, G03F 900

Patent

active

059980664

ABSTRACT:
A method of producing a high resolution expanded analog gray scale mask is described. Using an inorganic chalcogenide glass, such as a selenium germanium, coated with a thin layer of silver, a gray scale mask may be produced with accurate control of the size, uniformity and variance of the pixels. The selenium germanium glass is composed of column structures arranged perpendicularly to the substrate giving a possible edge precision of 100 .ANG.. The column structures also prevent undercutting during the etching process, thus permitting pixels to be placed close together. Accordingly, selenium germanium may be used as a high resolution gray scale mask with an expanded analog gray scale. The gray scale mask may be used to impress information as a modulated thickness on a selenium germanium photoresist film on an inorganic substrate. The selenium germanium photoresist film may then transfer the gray scale to the substrate.

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