Grating test patterns and methods for overlay metrology

Details Grating test patterns and methods for overlay metrology Grating test patterns and methods for overlay metrology

2005-02-15

2005-02-15

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S394000

Reexamination Certificate

active

06855464

ABSTRACT:
Overlay measurements are obtained by forming a first grating test pattern using a first layer mask. A second grating test pattern is formed using a second layer mask. The first and second grating test patterns have the same periodicity. The first and second grating test patterns are measured using an optical metrology equipment. The alignment of the second layer mask to the first layer mask is measured based on the measurement of the first and second grating test patterns.

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Neal T. Sullivan, Semiconductor Pattern Overlay, 15 pages, Digital Equipment Corp., Advanced Semiconductor Development, Hudson, MA 01749-2895.

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