Metal treatment – Process of modifying or maintaining internal physical... – Magnetic materials
Patent
1995-05-24
1999-10-05
Ip, Sikyin
Metal treatment
Process of modifying or maintaining internal physical...
Magnetic materials
148111, C21D 812
Patent
active
059617446
ABSTRACT:
Grain oriented silicon steel sheet on which is formed an insulating coating having a thickness that is not less than 2.5 .mu.m that imparts tension to the steel sheet which does not have an inorganic mineral layer formed during a final annealing step (glass film) and a method of forming on grain oriented silicon steel sheet an insulating coating that is not less than 2.5 .mu.m thick and which imparts tension to the steel sheet which does not have the inorganic mineral layer (glass film) that forms during finish annealing, and a method of forming a tensioning insulating coating on grain oriented silicon steel sheet which has been finish annealed and does not have an inorganic mineral surface layer (glass film), after first forming a layer of SiO.sub.2 not less than 0.001 .mu.m thick on the oriented silicon steel sheet.
REFERENCES:
patent: 4255205 (1981-03-01), Morito et al.
patent: 4875947 (1989-10-01), Nakayama et al.
patent: 4909864 (1990-03-01), Inokuti et al.
Morito, N. and Ichida, T. "Transition from external to internal oxidation in iron-silicon alloy as a function of oxygen potential of the ambient atmoshere," Scripta Metallurgica, vol. 10, pp. 619-622, 1976.
Fujii Hiroyasu
Kuroki Katsurou
Masui Hiroaki
Nagashima Takeo
Tanaka Osamu
Ip Sikyin
Nippon Steel Corporation
LandOfFree
Grain oriented silicon steel sheet having low core loss and meth does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Grain oriented silicon steel sheet having low core loss and meth, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Grain oriented silicon steel sheet having low core loss and meth will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1166650