Grafted microporous separator for electrochemical generator and

Details Grafted microporous separator for electrochemical generator and Grafted microporous separator for electrochemical generator and

1996-02-12

1996-11-26

Nuzzolillo, Maria

Chemistry: electrical current producing apparatus, product, and

Current producing cell, elements, subcombinations and...

Separator, retainer, spacer or materials for use therewith

429194, 429253, H01M 216

Patent

active

055784003

ABSTRACT:
A separator for an electrochemical generator is constituted by a microporous polyolefin film grafted with at least one monomer selected from diethyleneglycol dimethacrylate, furfuryl acrylate and a diethyleneglycol dimethacrylate/acrylic acid mixture. In a process for the production of a separator of this kind grafting of the monomer is carried out in three stages:
irradiation of the film,
if required, storage of the irradiated film,
immersion of the irradiated film in the grafting solution comprising the monomer, a solvent, and at least one additive. The separator may be used in an electrochemical generator with either an aqueous or nonaqueous electrolyte where the salt concentration is between 1M and 2M.

REFERENCES:
patent: 3982960 (1976-09-01), Hoekje et al.
patent: 4539277 (1985-09-01), Ishigaki et al.
patent: 4629540 (1986-12-01), Geniees et al.
patent: 4705636 (1987-11-01), Small et al.
patent: 5270137 (1993-12-01), Kubota
JP 62258711 dated Nov. 11, 1987 (Asahi Chemical Ind.).
French Search Report FR 9209900.

Affiliated with

Also associated with

Rating

Grafted microporous separator for electrochemical generator and does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Grafted microporous separator for electrochemical generator and , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Grafted microporous separator for electrochemical generator and will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1971679