Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1997-10-30
1999-11-23
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429801, 20429802, 36446826, 427553, 427554, 118620, 118641, C23C 1434
Patent
active
059893974
ABSTRACT:
Process control for generating graded multilayer films repetitively and consistently using both pulsed laser sputtering and magnetron sputtering deposition techniques. The invention includes an apparatus which allows for set up of an ultrahigh vacuum in a vacuum chamber automatically, and then execution of a computer algorithm or "recipe" to generate desired films. Software operates and controls the apparatus and executes commands which control digital and analog signals which control instruments.
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Laube Samuel J. P.
LeClair Steven R.
Voevodin Andrey A.
Zabinski Jeffrey S.
Hollins Gerald B.
Kundert Thomas L.
Mercado Julian A.
Nguyen Nam
The United States of America as represented by the Secretary of
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