Graded index waveguide structure and process for forming same

Details Graded index waveguide structure and process for forming same Graded index waveguide structure and process for forming same

1980-08-07

1983-03-01

Lee, John D.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

65 314, 427163, 430321, 430329, G02B 5174

Patent

active

043753124

ABSTRACT:
The specification discloses a process for forming a graded index waveguide structure by first providing a substrate of a first selected optical material having a chosen index of refraction. Next, a patterned layer of a second optical material is formed on one surface of the substrate or, optionally, within selected cavities formed in the substrate. This second optical material has a refractive index which is larger than the refractive index of the substrate. The patterned layer of the second optical material is formed in a predetermined geometry and to a predetermined thickness. Then, a layer of a third selected optical material is formed on the patterned layer of the second optical material and on the substrate surface to a predetermined thickness. This third optical material has a refractive index which is substantially the same as the refractive index of the substrate. Finally, the substrate with the patterned layer of the second optical material and the layer of the third optical material deposited thereon is heated to an elevated temperature for a period of time sufficient to diffuse the second optical material into the first and third optical materials and to form a graded index waveguide structure.

REFERENCES:
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patent: 4090776 (1978-05-01), Bernal et al.
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patent: 4288510 (1981-09-01), Tinet et al.
patent: 4329016 (1982-05-01), Chen
Butusov et al., "Optical Waveguides on SiO.sub.2 Substrates . . .", Applied Physics, vol. 21, No. 2, Feb. 1980, pp. 159-162.
Neuman et al., "Ion-Exchanged Optical Waveguides", Proc. of E-O Laser Intl. Conf., Brighton, U.K., Mar. 1980, pp. 19-30.

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