Gradation mask method of producing the same and method of formin

Details Gradation mask method of producing the same and method of formin Gradation mask method of producing the same and method of formin

1996-08-27

1998-11-03

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 7, G03F 900

Patent

active

058306056

ABSTRACT:
To provide a gradation mask which can easily assure distribution of desired exposure intensity. (FIG. 1) is uniformly formed on a transparent substrate 1 such that they have a transmittance of 10% or less. An etching mask having a desired pattern is formed on the metal and/or metallic compound film 2. The metal and/or metallic compound film 2 is dry- or wet-etched. The metal and/or metallic compound film 2 is repeatedly subject to patterning and etching steps by using etching masks with different patterns, so that the obtained layers have a thickness Z(X, Y) varying in three or more steps in accordance with desired transmittance.

REFERENCES:
patent: 5547787 (1996-08-01), Ito et al.
patent: 5567550 (1996-10-01), Smayling

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