Gradation mask and process for producing the same

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

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430 7, 430322, G03F 900

Patent

active

057259755

ABSTRACT:
A gradation mask having spatially stepped transmittance in at least three steps including substantially 0% and substantially 100%, the transmittance being regulated stepwise by varying the thickness of a homogeneous film of a chromium compound provided on a transparent substrate sheet. A process for producing a gradation mask having spatially stepped transmittance in at least three steps including substantially 0% and substantially 100%, including the steps of: forming on a transparent substrate sheet a homogeneous film of a chromium compound in a thickness enough to have a transmittance of at least 0%; removing the chromium compound film in predetermined areas by etching; and reducing the thickness of the remaining chromium compound film in predetermined areas by etching to such an extent that the transmittance is a predetermined intermediate value. A gradation mask having spatially stepped transmittance in at least three steps including substantially 0% and substantially 100%, wherein the area having a transmittance of at least substantially 0% has a predetermined transmittance other than 0% and 100% and includes a semitransparent film provided in a fine repeating pattern on a transparent substrate sheet. The semitransparent film in a fine repeating pattern is provided in such a manner that the phase difference is substantially the half-wavelength of a wavelength used or a value obtained by multiplying the half-wavelength by an odd number.

REFERENCES:
patent: 5095379 (1992-03-01), Fukunaga et al.
patent: 5213916 (1993-05-01), Cronin et al.
patent: 5225035 (1993-07-01), Rolfson
patent: 5286581 (1994-02-01), Lee

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