Gold plating bath additives for copper circuitization on polyimi

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Coating predominantly nonmetal substrate

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205266, 205926, 205920, C25D 348, C25D 554, C25D 712

Patent

active

051768119

ABSTRACT:
Disclosed is a method of fabricating a microelectronic package, especially a microelectronic package having gold plated copper circuitization on a polyimide substrate. The method includes the steps of forming a pattern of copper circuitization on the selected portions of the polyimide substrate, and thereafter depositing a gold thin film of selected portions of the copper circuitization layer. The gold thin film is electrodeposited from an electrodeposition solution of KAu(CN).sub.2, K.sub.2 HPO.sub.4, and KH.sub.2 PO.sub.4, modified by the addition of an effective amount of NH.sub.4.sup.+.

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Microelectronics Packaging Handbook-"Chip-To-Package Interconnections", N. G. Koopman et al.; pp. 361-453.

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