1980-07-21
1984-02-14
Larkins, William D.
357 41, 357 64, H01L 2704, H01L 29167
Patent
active
044320086
ABSTRACT:
Resistive elements of semiconductor devices and integrated circuits are reduced in size thereby allowing larger scale integration. Deep level dopants including impurities or crystalline lattice defects, or both, are formed in a low resistance doped region thereby increasing the resistance of a portion of the doped region. Resistive contacts and interconnects require less semiconductor surface area.
REFERENCES:
patent: 3286138 (1966-11-01), Shockley
patent: 3341754 (1967-09-01), Kellett et al.
patent: 3484658 (1969-12-01), Komatsu
patent: 3504239 (1970-03-01), Johnson et al.
patent: 3683306 (1972-08-01), Bulthuis et al.
patent: 3796929 (1974-03-01), Nicholas et al.
patent: 4063210 (1977-12-01), Collver
patent: 4323913 (1982-04-01), Murrmann et al.
patent: 4326213 (1982-04-01), Shirai et al.
Applied Physics, vol. 10, pp. 181-185, 1976, Runge et al.
Whight et al., Solid State Electronics, vol. 19, pp. 1021-1027, 1976.
Ku, Solid State Electronics, vol. 20, pp. 803-812, 1977.
Larkins William D.
The Board of Trustees of the Leland Stanford Junior University
LandOfFree
Gold-doped IC resistor region does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Gold-doped IC resistor region, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gold-doped IC resistor region will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2377743