Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1977-05-31
1978-09-26
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
204298, 313153, 313161, 313187, 313210, 313217, C23C 1500
Patent
active
041167945
ABSTRACT:
A method and apparatus for providing a completely closed plasma trap in an r.f. type glow discharge system to enable enhanced sputtering from a pair of electrodes so that substrates may be suitably coated. The electrode pairs may be post type, hollow or planar, in various shapes with and without end wings. All configurations utilize a cooperating magnetic field, provided by field coils external or internal to the electrodes, the magnetic field being shaped to define with the electrodes at least one plasma containing trap having axial symmetry imposed by the magnetic field and/or the electrode structure. The trap may be defined by the pair of electrodes acting in concert with each other and the magnetic field, one or more traps may be defined separately by each electrode and the magnetic field, or both types of traps may exist simultaneously in a hybrid situation. Means are also disclosed for mounting, centering, cooling, assembling, and making electrical contact with various of the electrode structures. Means are further disclosed for protecting various structural elements from undesired exposure to plasma, preventing conductive plating of insulators, due to undesired deposition of target material, and shielding the entire glow discharge system to prevent undesired r.f. radiation leakage to the surrounding environment.
REFERENCES:
patent: 3458426 (1969-07-01), Rausch et al.
patent: 3728246 (1973-04-01), Barkhudarov et al.
Penfold Alan S.
Thornton John A.
Telic Corporation
Weisstuch Aaron
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