Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – With means applying electromagnetic wave energy or...
Patent
1985-06-20
1987-05-12
Terapane, John F.
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
With means applying electromagnetic wave energy or...
422907, 42218629, 204298, 118715, 118620, B01J 1908
Patent
active
046648909
ABSTRACT:
A glow-discharge decomposition apparatus comprises ground electrodes, substrates, RF-electrodes, a RF-power supply, a matching circuit and a controlling circuit having at least one electric element. Each of the substrates is provided on the ground electrodes which are placed over each of the RF-electrodes in parallel to each other. Each of the RF-electrodes standing in parallel are electrically insulated to each other. The matching circuit is connected to accept a RF-power from the RF-power supply. The controlling circuit is connected to accept a RF-power from the matching circuit. The outputs of the controlling circuit are connected to supply RF-powers to the RF-electrodes. The films are fabricated on the substrates by supplying RF-powers being independently controlled via the controlling circuit, thereby plasmas are controlled over each of the RF-electrodes. Thus, deposition rates are individually controlled and uniform films are fabricated on each of the substrates.
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Preparation of A-Si:H Films and Devices in the Interdigital Vertical Electrode Deposition Apparatus by H. Sakai et al, May 1981, pp. 76-78, Fuji Electric Corporate Research and Development Ltd.
Ikuchi Nozomu
Nakayama Takehisa
Tai Masahiko
Tawada Yoshihisa
Kanegafuchi Kagaku Kogyo & Kabushiki Kaisha
Shimadzu Corporation
Terapane John F.
Wolffe Susan
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