Coating apparatus – Gas or vapor deposition – With treating means
Patent
1983-12-19
1985-04-23
Smith, John D.
Coating apparatus
Gas or vapor deposition
With treating means
118730, 118728, 118 501, 427 39, 427 47, 313619, C23C 1308
Patent
active
045122849
ABSTRACT:
An improved apparatus for preparing a coating by subjecting gaseous reactant precursors to a glow discharge is disclosed. The improvement comprises an electrode which is larger in all dimensions than the substrate which is to be coated. Electrically insulated magnets are arranged such that the area of the magnets is proportionally distributed with respect to the area of the substrate to be coated, whereby enhanced uniformity of quality and thickness of the deposited coating are provided. Unexpectedly the coating deposition rate increases substantially without increasing the power required or precursor consumption, and further, the temperature does not markedly increase during deposition.
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"Room Temperature Glow Discharge Deposition of Silicon Oxides from SiH.sub.4 and N.sub.2 O", Kaganowicz, Ban and Robinson, 1983.
Kaganowicz Grzegorz
Robinson John W.
Furman Theodore R.
Morris Birgit E.
Plantz Bernard F.
RCA Corporation
Smith John D.
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