Glow discharge apparatus for continuously manufacturing semicond

Coating apparatus – Gas or vapor deposition – Running length work

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Details

118719, 118723E, 118733, C23C 1650, C23C 1654

Patent

active

052661164

ABSTRACT:
An apparatus continuously manufactures a semiconductor device. A plurality of glow discharge regions are connected by gas gates. A sufficiently long belt-shaped substrate having a desired width is arranged along a path in which the substrate sequentially penetrates the glow discharge regions. The belt-shaped substrate is continuously conveyed in a longitudinal direction while depositing a semi-conductor layer of a conductivity type in each of the glow discharge regions, thereby continuously manufacturing the device having a semiconductor junction. A plurality of rotatable rollers are arranged in a slit-shaped separating passage of the gas gates so as to support the back surface of the belt-shaped substrate while rotating the rollers.

REFERENCES:
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patent: 4438724 (1984-03-01), Doehler et al.
patent: 4450786 (1984-05-01), Doehler et al.
patent: 4462332 (1984-07-01), Nath et al.
patent: 4664951 (1987-05-01), Doehler
patent: 4763601 (1988-08-01), Saida et al.
patent: 4951602 (1990-08-01), Kanai

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