Etching a substrate: processes – Forming or treating optical article
Patent
1999-11-17
2000-07-25
Gulakowski, Randy
Etching a substrate: processes
Forming or treating optical article
216 2, 216 11, C03C 2300, B29B 1100, G02B 610
Patent
active
060933348
ABSTRACT:
A glass wave guide element, which is small in size and amenable to integration and mass-production, and a method of manufacturing the glass wave guide element are provided. The glass wave guide element includes a core having a diffraction grating formed on an under cladding, an over cladding covering the core and a heater for changing the Bragg wavelength of the diffraction grating, the heater being arranged on the over cladding. The core and a central portion of both claddings in a surrounding portion around the core are formed in a state of being continuously separated along a longitudinal direction of the core from the substrate through a gap, and the core and the surrounding portion around the core are formed in a state of being spatially intermittently separated in a width direction of the core from a surrounding portion of both claddings through a gap. The wave guide is formed by etching to form gaps spaced intermittently along both sides of a core with under cladding and over cladding, and then removing a patterned silicon film from underneath the core.
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Arai Hideaki
Kobayashi Dai
Suzuki Ryoji
Tamura Korenori
Uetsuka Hisato
Alanko Anita
Gulakowski Randy
Hitachi Cable Ltd.
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