Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Patent
1999-06-21
2000-07-11
Pham, Hoa Q.
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
3562397, G01N 2100
Patent
active
060880929
ABSTRACT:
An optical inspection station for inspecting a substrate. The substrate may include a first surface and a second surface. Light is reflected from both the first and second surfaces of the substrate. The light reflected from the first surface is detected by a light detector. A controller may determine a surface characteristic of the first surface from the detected light. The system may include a spatial filter that filters the light reflected from the second surface. The spatial filter eliminates the optical noise that may be created by the light reflected from the second surface.
REFERENCES:
patent: 3792930 (1974-02-01), Obenreder
patent: 3857637 (1974-12-01), Obenreder
patent: 5712701 (1998-01-01), Clementi et al.
patent: 5875029 (1999-02-01), Jann et al.
Chen Li
Chhibber Raj
Nguyen Sang Hoang
Pham Hoa Q.
Phase Metrics, Inc.
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