Etching a substrate: processes – Nongaseous phase etching of substrate – Etching inorganic substrate
Patent
1995-05-23
1997-04-08
Breneman, R. Bruce
Etching a substrate: processes
Nongaseous phase etching of substrate
Etching inorganic substrate
216 22, 252 793, C03C 1500, C09K 1308
Patent
active
056184484
ABSTRACT:
Disclosed herein is a substrate for a magnetic disc comprising a glass substrate having fine protrusions on its surface, the protrusions having a height of 50 to 1000 .ANG., a width of 0.01 to 1 .mu.m, a density of 10 to 1000 per 100 .mu.m.sup.2 and an area ratio of 0.1 to 50%, and a ratio of peak height on a mean line (R.sub.p) to maximum height (R.sub.max) with respect to surface roughness of the substrate being at least 60%. Further, a process for preparing the substrate and a magnetic disc having the substrate are disclosed. Because the substrate according to the present invention has appropriate protrusions on its surface, a friction force and an adsorbing force between a head and a magnetic disc can be reduced, leading to the improvement of the CSS and the anti-head stick properties. In addition, the S/N ratio is not affected because the fine concave portions formed on the surface of the substrate are shallow.
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Kuroe Toru
Mouri Daisuke
Yokoyama Fumiaki
Alanko Anita
Breneman R. Bruce
Buckley Linda M.
Conlin David G.
Mitsubishi Kasei Corporation
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