Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2005-03-22
2005-03-22
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C428S426000
Reexamination Certificate
active
06869732
ABSTRACT:
A glass substrate is to be used as a photomask having a patterned light-shielding film on a surface thereof and thus exposed to light. The substrate is leveled by local plasma etching such that an exposure surface may have a flatness of 0.04-2.2 nm/cm2. Since the glass substrate is configured such that the exposure surface or hold surface of the resulting photomask is fully flat during the exposure step, it is suited for use as silica glass substrates for photomasks used in the photolithography of great interest in the fabrication of ICs, thus contributing to the achievement of finer patterns in the semiconductor field.
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Patent Abstracts of Japan, vol. 1999, No. 01, Jan. 29, 1999, & JP 10 273788 A (Mori Yuzo; Nikon Corp), Oct. 13, 1998.
“Phase Shift Mask Fabrication Using Reactive Ion Etchng of Quartz Substrates,” Research Disclosure, Kenneth Mason Publications, Hampshire, GB, No. 340, Aug. 1, 1992, p. 682 XP000324137.
M. Takeuchi et al., Properties Of Our Developing Next Generation Photomask Substrate, INSPEC, XP002194301.
Shibano Yukio
Takeuchi Masaki
Millen White Zelano & Branigan P.C.
Rosasco S.
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