Glass substrate for mask blank and method of polishing for...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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C451S036000, C451S041000, C065S060100, C065S061000

Reexamination Certificate

active

07923178

ABSTRACT:
The present invention aims at providing a glass substrate required to have a surface polished with extremely high accuracy as in glass substrates for reflective masks for use in EUVL; and a polishing method for producing the glass substrate. The present invention provides a glass substrate for mask blank, which is a glass substrate comprising SiO2as a main component and having a polished main surface, wherein concave defects and convex defects on the main surface have a depth of 2 nm or smaller and a height of 2 nm or smaller, respectively, and have a half-value width of 60 nm or smaller, so that the concave defects and/or the convex defects do not cause phase defects when the glass substrate is used to produce a mask for exposure and the mask is used. Also disclosed are a polishing method for producing the glass substrate, and a mask blank and a mask for exposure using the glass substrate.

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U.S. Appl. No. 12/631,004, filed Dec. 4, 2009, Kojima, et al.
U.S. Appl. No. 12/635,872, filed Dec. 11, 2009, Kojima, et al.

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