Glass substrate for data recording medium and manufacturing...

Glass manufacturing – Processes – With chemically reactive treatment of glass preform

Reexamination Certificate

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Details

C051S308000, C065S031000, C065S061000, C216S052000, C216S053000, C451S037000, C451S041000

Reexamination Certificate

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07010939

ABSTRACT:
In a first polishing step, or in a first half of a super precision polishing, a surface of a glass substrate is polished with a first suspension. The first suspension contains particles and a dispersion agent in which the particles are dispersed. The main ingredient of the particles is silicon dioxide (SiO2), and the average size (D50) of the particles is equal to or less than 100 nm. The dispersion medium comprises an acid solution the pH of which is equal to or less than 4. In a second polishing step, or in a latter half of the super precision polishing, the surface of the glass substrate is continuously polished with a second suspension. The second suspension contains particles and a dispersion agent in which the particles are dispersed. The main ingredient of the particles is silicon dioxide (SiO2), and the average size (D50) of the particles is equal to or less than 100 nm. The dispersion medium comprises an alkaline solution the pH of which is equal to or more than 8.5.

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patent: 2001-288455 (2001-10-01), None

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