Glass layer fabrication

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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Details

313220, 313221, 427 78, 427248R, B05D 306

Patent

active

041044185

ABSTRACT:
The construction of the dielectric layer of a panel used in making a gas panel display by an E-gun evaporation process in the same evacuated chamber that deposits an electron-emissive layer on the panel so as to obtain increased efficiency in the fabrication and improved operating characteristics of the gas panel. Stress free dielectric layers are obtained by E-gun evaporating borosilicate glass from a molten pool of borosilicate having an area of at least 2cm.sup.2 up to about 10cm.sup.2 with the substrate for the layers being maintained at from 200.degree. C to 300.degree. C and the evaporation rate being 40 to 80 A/sec. at approximately 10 inches from the molten pool.

REFERENCES:
patent: 3450824 (1969-06-01), Hanks et al.
patent: 3499167 (1970-03-01), Baker et al.
patent: 3801356 (1974-04-01), Mulfinger et al.
patent: 3836393 (1974-09-01), Ernsthausen et al.

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