Glass frits containing WO.sub.3 or MoO.sub.3 in RuO.sub.2 -based

Details Glass frits containing WO.sub.3 or MoO.sub.3 in RuO.sub.2 -based Glass frits containing WO.sub.3 or MoO.sub.3 in RuO.sub.2 -based

1983-10-28

1984-08-07

Lusignan, Michael R.

Coating processes

Electrical product produced

Resistor for current control

427103, 4271265, 4273762, 427380, 427404, 4274192, 338307, 338308, H01C 700, H01C 1706, H01C 1730

Patent

active

044644213

ABSTRACT:
This invention is concerned with the fabrication of thick film, RuO.sub.2 -based resistors. More specifically, this invention is directed to the formulation of glass frits for use in such resistors exhibiting temperature coefficient of resistance values of less than 100 ppm. Such glass frits consist essentially, expressed in terms of mole percent on the oxide basis, of about 32-39% PbO, 44-47% B.sub.2 O.sub.3, 14-17% SiO.sub.2, and an effective amount up to 5% of WO.sub.3 or MoO.sub.3.

REFERENCES:
patent: 2557545 (1951-06-01), Kerridge
patent: 3304199 (1967-02-01), Faber et al.
patent: 3766511 (1973-10-01), De Vries et al.
patent: 3916037 (1975-10-01), Brady et al.
patent: 3924221 (1975-12-01), Winkler
patent: 4286251 (1981-08-01), Howell
patent: 4379195 (1983-04-01), Prabhu et al.

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