Glass for photoetching mask

Details Glass for photoetching mask Glass for photoetching mask

1982-08-31

1983-09-06

Bell, Mark

Compositions: ceramic

Ceramic compositions

Glass compositions, compositions containing glass other than...

501 62, C03C 304, C03C 310

Patent

active

044030436

ABSTRACT:
A glass composition for a photoetching mask is described, which comprises, all by mol, 55 to 70% SiO.sub.2, 7 to 11% Al.sub.2 O.sub.3, 7 to 20% CaO, 3 to 13% MgO, 3 to 13% ZnO, 0.5 to 3% K.sub.2 O or Na.sub.2 O, 0 to 11% PbO and 0 to 3% ZrO.sub.2. This glass is free from defects such as pinholes, has a relatively low coefficient of thermal expansion and contains no air bubbles, and a photoetching mask composed of the glass composition.

REFERENCES:
patent: 3069294 (1962-12-01), Davis
patent: 3847627 (1974-11-01), Erickson et al.
patent: 4102692 (1978-07-01), Schartam et al.
patent: 4297141 (1981-10-01), Tokanaga et al.

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