Gettering of particles from an electro-negative plasma with insu

Details Gettering of particles from an electro-negative plasma with insu Gettering of particles from an electro-negative plasma with insu

1996-09-10

1998-12-01

Dang, Thi

Semiconductor device manufacturing: process

Including control responsive to sensed condition

Electrical characteristic sensed

438474, 438798, H05H 100, H01L 2100

Patent

active

058438009

ABSTRACT:
Apparatus controls a wafer potential in a plasma system when the plasma is off to keep the wafer slightly negative at all times in order to reduce and eliminate the collection of charged particles on the wafer. The apparatus allows the wafer bias to be reduced to a small negative voltage and then holds that voltage. This greatly reduces the net positive flux to the wafer. A diode and a programmed power supply hold a minimum negative voltage on the back of the wafer electrode when the plasma density is decaying to zero.

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patent: 5414324 (1995-05-01), Roth et al.
patent: 5433813 (1995-07-01), Kuwabara
patent: 5460684 (1995-10-01), Saeki et al.

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