Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1996-10-30
1999-01-05
Kastler, Scott
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
134 2, 2521816, C01B 1514
Patent
active
058558594
ABSTRACT:
A gettering agent for gettering metals from a solution. The gettering agent has a surface layer of SiO.sub.2 which is greater than 15 angstroms in thickness.
REFERENCES:
patent: 4256587 (1981-03-01), Carnahan et al.
patent: 4337555 (1982-07-01), Hancock et al.
patent: 4687573 (1987-08-01), Miller et al.
patent: 4687581 (1987-08-01), Macedo et al.
patent: 4902426 (1990-02-01), Macedo et al.
patent: 5164093 (1992-11-01), Chilton et al.
patent: 5175110 (1992-12-01), Bradshaw et al.
patent: 5178768 (1993-01-01), White, Jr.
patent: 5286464 (1994-02-01), Drogisich
patent: 5405535 (1995-04-01), Yamamoto
Bruening, et al. "Effect of Organic Solvent and Anion Type on Cation Binding Constants with Silica Gel Bound Macrocycles and their Use in Designing Selective Concentrator Columns" Analytical Chemistry, vol. 63, No. 1 (Jan. 1991) pp. 21-24.
R. Kocjan "Additional Purification of Some Salts by Using Silica Gel Modified with Calmagit as a Sorbent" Separation Science & Technology, vol. 27, No. 314 (1992) pp. 409-417.
R. Kocjan, et al. "Calcon-Modified Silica Gel Sorbent. Application to Preconcentration or Elimination of Trace Metals" Talanta, vol. 39, No. 114 (1992) pp. 63-68.
Phelan, et al. "Combined Reagent Purification and Sample Dissolution (CORPAD) Applied to the Trace Analysis of Silicon, Silica and Quartz" Analyst, vol. 109 (Oct. 1984) pp. 1269-1272.
Pirooz Saeed
Shive Larry W.
Kastler Scott
MEMC Electronic Materials , Inc.
LandOfFree
Gettering agent does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Gettering agent, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gettering agent will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-859456