Generation of permanent phase holograms and relief patterns in d

Details Generation of permanent phase holograms and relief patterns in d Generation of permanent phase holograms and relief patterns in d

1974-05-22

1976-03-16

Smith, Ronald H.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

96 27H, 96 383, 156 13, 350 35, G03C 500

Patent

active

039444201

ABSTRACT:
A surface relief pattern, e.g. a surface relief hologram, is substantially linearly transferred to a hard durable substrate, capable of being used as a medium for permanent storage of the pattern or as a master for replicating the hologram, from a photoresist coated on the substrate, by exposing the photoresist and the substrate to a photoresist developer bath and a chemical bath capable of etching the substrate at a rate substantially proportional to the development rate of the photoresist. This technique allows the transfer of surface relief patterns with dimensions on the order of one micron or less, and is applicable to the formation of surface relief holographic patterns in permanent media for archival storage and to making master surface relief holograms.

REFERENCES:
patent: 1922434 (1933-08-01), Gundlach
patent: 3489624 (1970-01-01), Lake et al.
patent: 3539408 (1970-11-01), Cashan et al.
patent: 3573948 (1971-04-01), Tarnopol
patent: 3580657 (1971-05-01), Sheridon
patent: 3667946 (1972-06-01), Sturdevant
patent: 3669673 (1972-06-01), Ih et al.
patent: 3680945 (1972-08-01), Sheridon
patent: 3787213 (1974-01-01), Gervay et al.
Hanak, J. J. et al., "Permanent Holograms in Glass by R. F. Sputter Etching", RCA Review, Vol. 32, June 1971, pp. 319-323.
Magill, P. J. et al., "J. Electrochem. Soc. : Solid State Science" Vol. 118, No. 9, pp. 1514-1516, Sept. 1971.

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