Generation of fluorine via thermal plasma decomposition of metal

Details Generation of fluorine via thermal plasma decomposition of metal Generation of fluorine via thermal plasma decomposition of metal

1991-08-13

1993-05-04

Lewis, Michael

Chemistry of inorganic compounds

Radioactive

Uranium compound

423259, 423489, 423490, 423500, 423DIG10, C01B 720, C01B 908, C01G 4306, C01G 4301

Patent

active

052079996

ABSTRACT:
A compound MF.sub.n, where M is a metal and n is the valency of the metal and has a value between 1 and 6, is subjected to a thermal plasma at a temperature in excess of 3000 K to dissociate it into the metal and fluorine. Also present in the reactor is an added reactant that will react with the metal or the fluorine to prevent their recombination so that there is formed fluorine gas or a fluoride other than the fluoride of the metal M.

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patent: 4564507 (1986-01-01), Elliott
patent: 4689178 (1987-08-01), Gay et al.
patent: 4874599 (1989-10-01), Gay et al.
patent: 5015863 (1991-05-01), Takeshima et al.
Journal of Nuclear Materials, 149 (1987) 103-104. "Production of Uranium Metal Using a Thermal Plasma".
Journal of Fluorine Chemistry, 8 (1976) 165-176. Moss "The Fluorination of Uranium and Vanadium Oxides with some Metal Fluorides".

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