Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1990-05-14
1992-04-14
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041828, B01D 6142, C25D 1300, C25B 100
Patent
active
051045125
ABSTRACT:
An electrophoretic system is provided which allows for carrying out electrophoresis while monitoring and regulating the temperature and the electrical field gradient in the gel. In addition, photometric monitoring is provided so as to monitor the progress of the electrophoretic separation and vary conditions to change the progress as desired. A computer is employed which receives the signals from the electrophoretic and photometric apparatuses and regulates temperature and voltage to either maintain conditions, or change the conditions to vary the progress of the electrophoresis. Gel molds are provided for forming the lanes in a gel plate, as well as a light module, for reading the bands present in the gel lanes with the photometer.
REFERENCES:
patent: 4306956 (1981-12-01), de Castro et al.
patent: 4657655 (1987-04-01), Smoot et al.
patent: 4810348 (1989-03-01), Sarrine et al.
Clappier Robert R.
Gombocz Erich A.
Kerth Wilhem
Rammler David H.
Roth Alex
Koestner Caroline
Labintelligence Inc.
Niebling John
Rowland Bertram I.
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