Etching a substrate: processes – Gas phase and nongaseous phase etching on the same substrate
Reexamination Certificate
2006-11-21
2006-11-21
Ahmed, Shamim (Department: 1765)
Etching a substrate: processes
Gas phase and nongaseous phase etching on the same substrate
C216S094000, C216S096000, C216S100000, C134S002000, C134S003000, C134S004000, C134S026000, C205S662000
Reexamination Certificate
active
07138066
ABSTRACT:
A method of surface treating heat treated members to remove oxide scale. The heat treated members are subjected to a staged series of discrete chemical and physical cleaning steps yielding a substantially scale-free surface readily adaptable for subsequent application of protective coatings.
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Cheng Yang-Tse
Lev Leonid C.
Lukitsch Michael J.
Paluch Robert F.
Weiner Anita M.
Ahmed Shamim
GM Global Technology Operations Inc.
Marra Kathryn A.
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