Gate valve for vacuum apparatus

Valves and valve actuation – Pivoted valves – Gate

Reexamination Certificate

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C251S327000

Reexamination Certificate

active

08028972

ABSTRACT:
Even when a gate valve for a vacuum apparatus used in a vapor deposition apparatus is in an open position, reliability of keeping a vapor deposition chamber vacuum can be improved by protecting an inner wall surface of a valve casing and a sealing member of a valve body against a vapor of a vapor deposition material. A gate valve (1) for a vacuum apparatus (50) is used as a gate valve for an electron gun (52). When the valve is in a closed position, as with the related art technique, a valve body (3) detaches an electron gun (52) part from a vapor deposition chamber (51). On the other hand, when the valve is in an open position, a valve chamber (15) is separated from the vapor deposition chamber (51) by inserting a cylindrical movable shield (22) into the valve chamber (15) to prevent the inner wall surface of a valve casing (2) and a sealing member (5,6,7) of the valve body (3) from being exposed to vapor in the vapor deposition chamber (51), with the result that they are protected against the deposition of a deposition material (MgO) (81).

REFERENCES:
patent: 2109042 (1938-02-01), Bennett et al.
patent: 2134324 (1938-10-01), Brackett
patent: 3557822 (1971-01-01), Chronister
patent: 3665953 (1972-05-01), Chronister
patent: 3799188 (1974-03-01), Chronister
patent: 5062445 (1991-11-01), Junier
patent: 6448567 (2002-09-01), Botelho et al.
patent: 2004/0104682 (2004-06-01), Horsky et al.
patent: 48-063832 (1973-08-01), None
patent: 55-109169 (1980-07-01), None
patent: 62-093467 (1987-06-01), None
patent: 2-074671 (1990-06-01), None
patent: 4-106583 (1992-09-01), None

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