Gate valve cleaning method and substrate processing system

Details Gate valve cleaning method and substrate processing system Gate valve cleaning method and substrate processing system

2008-01-04

2011-11-01

Kornakov, Michael (Department: 1714)

Cleaning and liquid contact with solids

Processes

With treating fluid motion

C134S021000, C134S022100, C134S022180, C134S001000

Reexamination Certificate

active

08048235

ABSTRACT:
A gate valve cleaning method that can clean a gate valve that brings an atmospheric transfer chamber and an internal pressure variable transfer chamber that transfer a substrate into communication with each other or shuts them off from each other without bringing about a decrease in the throughput of a substrate processing system. Before the gate valve brings the atmospheric transfer chamber and the internal pressure variable transfer chamber into communication with each other, the pressure in the internal pressure variable transfer chamber is increased so that the pressure in the internal pressure variable transfer chamber can become higher than the pressure in the atmospheric transfer chamber.

REFERENCES:
patent: 5649338 (1997-07-01), Kato
patent: 5950646 (1999-09-01), Horie et al.
patent: 2003/0045131 (2003-03-01), Verbeke et al.
patent: 2006-128578 (2006-05-01), None

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