Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material
Reexamination Certificate
2007-09-25
2007-09-25
Ngô, Ngân V. (Department: 2818)
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
Amorphous semiconductor material
C257S071000, C257S350000, C257S352000, C257SE29117
Reexamination Certificate
active
10910350
ABSTRACT:
A TFT including a gate metallic layer, a body layer doped with a dopant having a first polarity, a source layer and a drain layer doped with a dopant having a second polarity, a semiconductor layer formed between the source layer and the drain layer, and a contact coupling the gate metallic layer and the body layer.
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patent: 0 816 903 (1998-01-01), None
Assaderaghi, et al., “A Dynamic Threshold Voltage MOSFET (DTMOS) for Ultra-Low Voltage Operation,” Technical Digest, IEEE, pp. 809-812 (Dec. 11, 1994).
Choi Byoung-Deog
Kim Won-Sik
So Myeong-Seob
Ngo Ngan V.
Samsung SDI & Co., Ltd.
Stein, McEwen & Bui LLP
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