Gate comparator

Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Electrical signal parameter measurement system

Reexamination Certificate

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Details

C702S066000, C702S071000, C702S183000, C702S120000, C714S006130, C714S016000, C714S057000, C714S701000, C340S003420, C340S292000, C345S616000, C345S215000, C324S512000, C324S521000, C324S528000

Reexamination Certificate

active

06895349

ABSTRACT:
A gate comparator control panel, in accordance with the subject invention, allows a user to define up to four different gate regions that may exist on any of the live waveforms, maths waveforms, or REF waveforms. A menu for each gate controls the position of each gate and selects the source for the signal that is to be gated. All gates must be the same width. A high level application copies the gated region of a waveform into a REF memory. For example, Gate1would go into REF1, gate2into REF2and so on. A user-settable tolerance value is used to determine if difference between the waveforms of the gates reaches a point at which a violation is indicated. A master gate position control causes all gates to move by the same amount, thus maintaining a constant distance between them. A master gate width control causes all gates to change width. Run, pause, and stop menu items are used to control how the gates automatically scan though the waveforms to which they are attached while maintaining constant spacing between them. A comparison is performed on a point-by-point basis between the signals of the gates.

REFERENCES:
patent: 3810027 (1974-05-01), Cook et al.
patent: 4005477 (1977-01-01), Ottesen
patent: 5371851 (1994-12-01), Pieper et al.
patent: 5530454 (1996-06-01), Etheridge et al.
patent: 5999163 (1999-12-01), Ivers et al.
patent: 6009523 (1999-12-01), Owaki et al.
patent: 6215697 (2001-04-01), Lu et al.
patent: 089079 (2001-04-01), None
Singer et al., Technology Advances in VLF/LF Atmospheric Noise Generation and Characterization for Laboratory Use, May 10-12, 1994, IEEE, vol.: 1880, pp. 499-501.

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