Gasless ion plating

Details Gasless ion plating Gasless ion plating

1978-07-07

1980-09-09

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

118726, 118 501, 118620, 204298, 427 39, 427 451, 427 50, C23C 1500, C23C 1312

Patent

active

RE0304018

ABSTRACT:
A gasless ion plating process wherein plating material is melted, vaporized, and then subjected to an ionization environment in a low pressure chamber with a "virtual cathode" consisting of a plasma of ionized atoms of evaporant material created by evaporating in an RF field. It is a gasless ion plating process wherein the system ambient pressure prior to plating material evaporation may be much lower than that required to sustain a glow discharge, however, with vapor pressure of evaporant material added to the environment base pressure being such as to result in a plasma of ionized atoms of the plating material developing as the vaporized material approaches the RF cathode.

REFERENCES:
patent: 2443196 (1948-06-01), Raines et al.
patent: 3461054 (1969-08-01), Vratny
patent: 3492215 (1970-01-01), Conant
patent: 3736175 (1973-05-01), Carleton
patent: 3962988 (1976-06-01), Murayama et al.
patent: 3968019 (1976-07-01), Hanazono et al.
patent: 4016389 (1977-04-01), White
patent: 4170662 (1979-10-01), Weiss et al.
D. M. Mattox, "Fundamentals of Ion Plating," J. Vac. Sci. Technol., vol. 10, pp. 47-52 (1973).
L. Leder, "Fundamental Parameters of Ion Plating," Metal Finishing, pp. 41-45 (1974).
Berry et al., "Thin Film Technology," Van Nostrand Reinhold, N.Y., pp. 156-157, 142-144 (1968).
S. Aisenberg et al., "Physics of Ion Plating & Ion Beam Deposition," J. Vac. Sci. Technol., vol. 10, pp. 104-107 (1973).

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