Gases and the ensurance of extremely low levels of hydrogen

Details Gases and the ensurance of extremely low levels of hydrogen Gases and the ensurance of extremely low levels of hydrogen

1997-09-23

1999-10-19

Langel, Wayne

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

Hydrogen component

423210, 423219, 423230, 4232451, 423247, C01B 300

Patent

active

059684682

ABSTRACT:
An apparatus is described for the removal of impurity gases such as O.sub.2, CH.sub.4, CO, CO.sub.2 and H.sub.2 from impure inert gases such as rare gases and N.sub.2. The apparatus comprises an impure inert gas inlet, a housing containing first and second gas sorbing materials and a purified gas outlet. The first gas sorbing material may be a Zr--V--Fe getter alloy if the gas to be purified is a rare gas, whereas it may be a Zr--Fe alloy if the gas to be purified is N.sub.2. The second gas sorbing material is a Zr--Al alloy which ensures that the purified inert gas has an extremely low level of hydrogen. A process for the removal of impurity gases from inert gases and ensuring an extremely low level of hydrogen in the purified gas is also described.

REFERENCES:
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patent: 4312669 (1982-01-01), Boffito et al.
patent: 4405487 (1983-09-01), Harrah et al.
patent: 4515528 (1985-05-01), Young

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