Gaseous phase method accumulated film manufacturing apparatus

Details Gaseous phase method accumulated film manufacturing apparatus Gaseous phase method accumulated film manufacturing apparatus

1985-04-25

1987-03-03

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Work support

118715, 118 501, 118729, 414217, C23C 1308

Patent

active

046466819

ABSTRACT:
A gaseous phase method accumulated film manufacturing apparatus has one or more reaction furnace installation device on which a plurality of reaction furnaces for forming an accumulated film on a substrate by the gaseous phase method are movably installed, and one or more substrate conveying unit for conveying the substrate to the reaction furnaces.

REFERENCES:
patent: 2551389 (1951-05-01), Oliver
patent: 2730987 (1956-01-01), Nelson
patent: 3404661 (1968-10-01), Mathias et al.
patent: 4100879 (1978-07-01), Goldin
patent: 4226208 (1980-10-01), Nishida et al.
patent: 4514275 (1985-04-01), Shimada et al.

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