Gaseous mixture power laser apparatus

Coherent light generators – Particular active media – Gas

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

372 58, 372 59, 372 64, H01S 322

Patent

active

053735242

ABSTRACT:
Mixing power laser apparatus, comprising a generator of a flow of excited nitrogen (1), and structure (6; 19) to introduce a flow of CO.sub.2 into the flow of excited nitrogen. The generator (1) is of the cold corona electric discharge type operating at a pressure greater than 0.3.times.10.sup.5 Pa, and is coupled to a waveguide (2) with mirrors (3, 4) opposed along a principal direction of the waveguide. For use particularly in cutting material.

REFERENCES:
patent: 3895313 (1975-07-01), Seitz
patent: 4088966 (1978-05-01), Samis
patent: 4439860 (1984-03-01), Kurnit
patent: 4681396 (1987-07-01), Jones
patent: 4928286 (1990-05-01), Foreman et al.
patent: 5038357 (1991-08-01), Lavarini et al.
patent: 5210768 (1993-05-01), Seguin
Fahad S. Al-Mashaabi et al., "Direct Current-Excited CW CO.sub.2 Metal Waveguide Laser", May 15, 1989, pp. 1897-1903, Applied Optics, vol. 28, No. 10, New York.
Clyde O. Brown, "High-Power CO.sub.2 Electric Discharge Mixing Laser", Nov. 1, 1970, pp. 388-391, United Aircraft Research Laboratories, East Hartford, Conn.
Michel E. Marhic et al., "Whispering-Gallery CO.sub.2 Laser", Jun. 6, 1979, pp. 487-490, IEEE Journal of Quantum Electronics, vol. QE-15, No. 6.
Peter W. Smith, "Transversely Excited Waveguide Gas Lasers", Jul. 7, 1981, pp. 1166-1181, IEEE Journal of Quantum Electronics, vol. QE-17, No. 7.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Gaseous mixture power laser apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gaseous mixture power laser apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gaseous mixture power laser apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1198255

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.