Gaseous doping of tungsten oxide

Coating processes – Electrical product produced – Transparent base

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427108, 4271262, 4271263, 427165, 427166, 427255, 4272557, 427343, 20419226, 20419227, 20419224, 20419229, B05D 512

Patent

active

053245377

ABSTRACT:
The procsses disclosed is for preparing a film of fluorine-modified tungsten oxide on a substrate. The process comprises providing a tungsten oxide film on the substrate and then exposing the tungsten oxide film at an elevated temperature to a stream of a gaseous fluorocarbon. The exposure takes place for a time sufficient to modify the tungsten oxide with fluorine and form a film having modified infrared adsorption and reflectant properties.

REFERENCES:
patent: 3457106 (1922-07-01), Gillery
patent: 4172159 (1979-10-01), Marcault
patent: 4746549 (1988-05-01), Ito et al.
patent: 5102691 (1992-04-01), Russo et al.

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