Gaseous cleaning method for silicon devices

Details Gaseous cleaning method for silicon devices Gaseous cleaning method for silicon devices

1989-08-07

1990-05-08

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437228, 437233, 437234, 148DIG17, 156643, 156646, 252372, 252374, H01L 2100, H01L 2102, H01L 2130, H01L 21306

Patent

active

049238280

ABSTRACT:
A method for cleaning metallic impurities from a silicon surface of a semiconductor device is described. The first method includes, in sequence, the steps of:

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J. Ruzyllo et al., J. Electrochemical Society, vol. 136, No. 5, May, 1989, pp. 1474-1476.
Proceedings of the Seventh Symposium on Plasma Processing, vol. 88-22, The Electrochemical Society, Pennington, N.J., 1988, p. 151, G. S. Oehrlein et al.
K. R. Ryan and I. C. Plumb, Plasma Chemistry and Plasma Processes, vol. 4, No. 3, 1984.
d'Agostino et al., Plasma Chemistry and Plasma Processes, vol. 4, No. 1, 1984.
Ryan, K., Plasma Chemistry and Plasma Processes, vol. 4, No. 3, 1984.
d'Agostino, R., Plasma Chemistry and Plasma Processes, vol. 4, No. 1, 1984.
Ghandhi, S., VLSI Fabrication Principles, Chap. 9, Wiley & Sons, 1983.
Sze, S., VLSI Technology, Chap. 8, McGraw-Hill, 1983.

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