Gas-venting container

Details Gas-venting container Gas-venting container

2005-09-20

2005-09-20

Fidei, David T. (Department: 3728)

Special receptacle or package

Including ancillary article contacting medium

Gas medium

C383S102000, C383S100000

Reexamination Certificate

active

06945392

ABSTRACT:
A container includes a housing for containing an O2-generating composition. The housing includes a venting layer and a structural layer associated with the venting layer. The venting layer has a venting layer O2passage rate and a venting layer surface area, while the structural layer has a structural layer O2passage rate and a structural layer surface area. The venting layer O2passage rate is greater than the structural layer O2passage rate, and the structural layer surface area is less than the venting layer surface area. Alternatively, the structural layer may include a plurality of apertures and a patch associated with each aperture, instead of a venting layer. Each patch has a patch O2passage rate and the total O2passage rate of the container includes the sum of each patch O2passage rate. The total O2passage rate is at least about 0.2 L/(m2*24 hours).

REFERENCES:
patent: 3503497 (1970-03-01), Riely et al.
patent: 4404241 (1983-09-01), Mueller et al.
patent: 4579223 (1986-04-01), Otsuka et al.
patent: 4856650 (1989-08-01), Inoue
patent: 4884694 (1989-12-01), Sengewald
patent: 2001/0049001 (2001-12-01), Mueller

Affiliated with

Also associated with

Rating

Gas-venting container does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gas-venting container, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas-venting container will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3372135