Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1998-06-26
2000-09-19
Silverman, Stanley S.
Coating apparatus
Gas or vapor deposition
Multizone chamber
118 50, 118733, 414935, 414939, 417306, 137110, 137111, 137587, 137599, 13762411, 454238, 454255, C23C 1600
Patent
active
061206067
ABSTRACT:
The present invention provides a gas vent system for a vacuum chamber. The particle placed onto the wafer after loading out from a vacuum chamber can be greatly reduced by the system design. The gas vent system has a gas supply, an anti-vibrating tube, a gas regulator, a first line, a second line, a vent valve, and a filter. The anti-vibrating tube is connected after the gas supply for transferring gas without introducing vibration. The gas regulator is connected after the anti-vibrating tube for controlling a flow rate of the gas. The first line is connected after the gas regulator and has a first metering valve. The second line is connected after the gas regulator and is also connected in parallel with the first line. The second line has a second metering valve and an in-line valve in series. The vent valve is connected after the first line and the second line. The filter is connected between the vent valve and the vacuum chamber. In addition, the gas vent system can further include a pressure sensor for detecting a pressure of the vacuum chamber.
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patent: 4910042 (1990-03-01), Hokynar
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patent: 5385505 (1995-01-01), Sharp et al.
patent: 5759214 (1998-06-01), Ohmi et al.
Perry's Chemical Engineers' Handbook, 6th Ed., pp. 6-94 to 6.96, 1984.
Acer Semiconductor Manufacturing Inc.
Colaianni Michael P.
Silverman Stanley S.
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