Gas treatment method for removal of liquid droplets

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Utilizing mist prevention

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Details

204278, 204DIG13, 55255, 55256, C25D 2104, B01D 1900

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active

052231194

ABSTRACT:
There is disclosed a gas treatment method and apparatus for the treatment of exhaust gas from an electrochemical plating operation, particularly from a chromium plating operation, to remove therefrom essentially all liquid entrainment. The invention comprises containment of the vapor space over the electroplating baths and evacuating the contained vapor space, passing the gases from the vapor space through a water bath and discharging the gases from the water bath through a mist separator and a sub-micron porous filter. Preferably the mist separator and porous filter are separated by a vapor space to permit coalesced droplets to condense and separate from the gases before passing the gases through the porous filter.

REFERENCES:
patent: 3683594 (1972-08-01), Schouw
patent: 4443233 (1984-04-01), Moran
patent: 4592819 (1986-06-01), Suzuki et al.
patent: 4897247 (1990-01-01), Anderson
patent: 5004486 (1991-04-01), Chen
patent: 5078759 (1992-01-01), Kira
patent: 5104496 (1992-04-01), Dupree
patent: 5112465 (1992-05-01), Danielson
patent: 5129926 (1992-07-01), Harwell

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