Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture
Patent
1995-12-22
1997-12-02
Langel, Wayne
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
95231, 423220, 423226, 423228, 423229, 4232421, 4232422, 4232427, B01D 5314, C01B 1716, C01B 3120, C01B 1720
Patent
active
056932979
ABSTRACT:
A system and method for injecting a gaseous contaminant absorbent through at least one spray nozzle into a pipe transporting gas to a contacting vessel wherein the gas is contacted with a liquid absorbent to remove at least one gaseous contaminant from the gas is provided. The injection of the absorbent through the spray nozzles augments the efficiency of the contacting vessel by removal of a quantity of the gaseous contaminant from the gas prior to charging the gas to the contacting vessel. Water vapor is removed using a glycol absorbent and acidic gases are removed using an amine solution as an absorbent. A system and method for the removal of both water vapor and acidic gases is provided.
REFERENCES:
patent: 3255573 (1966-06-01), Cox, Jr.
patent: 4430316 (1984-02-01), Ranke et al.
patent: 4583998 (1986-04-01), Reid et al.
patent: 5084074 (1992-01-01), Beer et al.
patent: 5346537 (1994-09-01), Lowell
patent: 5364604 (1994-11-01), Spink et al.
patent: 5439509 (1995-08-01), Spink et al.
patent: 5565180 (1996-10-01), Spink
Bigger Jeffrey M.
Meyer James P.
Turner Harry M.
Atlantic Richfield Company
Langel Wayne
Scott F. Lindsey
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